Manufacturability Aware Routing in Nanometer VLSI (Foundations and Trends

Author: David Z. Pan
Edition:
Binding: Paperback
ISBN: 1601983506

Manufacturability Aware Routing in Nanometer VLSI (Foundations and Trends(r) in Electronic Design Automation)

Nanometer very large scale integrated (VLSI) circuit design faces tremendous challenges due to the manufacturing limitations. Get Manufacturability Aware Routing in Nanometer VLSI (Foundations and Trends computer books for free.
These manufacturing and process related challenges include the printability issues due to deep sub-wavelength lithography, the topography variations due to chemical-mechanical polishing (CMP), the random defects due to missing or extra material, and so on. Thus, design "closure" may not automatically guarantee the manufacturing closure due to the manufacturing yield loss. Manufacturability aware layout optimization plays a key role in the overall yield improvement. Manufacturability Aware Routing in Nanometer VLSI examines key aspects of manufacturability issues and how to alleviate them during the routing stage. It Check Manufacturability Aware Routing in Nanometer VLSI (Foundations and Trends our best computer books for 2013. All books are available in pdf format and downloadable from rapidshare, 4shared, and mediafire.

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These manufacturing and process related challenges include the printability issues due to deep sub-wavelength lithography, the topography variations due to chemical-mechanical polishing (CMP), the random defects due to missing or extra material, and so on. Thus, design "closure" may not automatically guarantee the manufacturing closure due to the manufacturing yield loss. Manufacturability aware layout optimization plays a key role in the overall yield improvement. Manufacturability Aware Routing in Nanometer VLSI examines key aspects of manufacturability issues and how to alleviate them during the routing stage hese manufacturing and process related challenges include the printability issues due to deep sub-wavelength lithography, the topography variations due to chemical-mechanical polishing (CMP), the random defects due to missing or extra material, and so on. Thus, design "closure" may not automatically guarantee the manufacturing closure due to the manufacturing yield loss. Manufacturability aware layout optimization plays a key role in the overall yield improvement. Manufacturability Aware Routing in Nanometer VLSI examines key aspects of manufacturability issues and how to alleviate them during the routing stage. It

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